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2003
Publications
| K. Ueda, K.
Takafuji, H. Hiramatsu, H. Ohta, T. Kamiya, M. Hirano,
and H. Hosono �gElectrical and Optical Properties and Electronic Structures of LnCuOS (Ln=La~Nd)�h Chem. Mater. 15 (2003) 3692-3695 |
| K. Ueda, S. Inoue,
S. Hirose, H. Kawazoe, and H. Hosono �gWide-gap p-type conductive properties in layered oxychalcogenides�h Mat. Res. Soc. Symp. Proc. 747 (2003) V2.1.1-11 |
| K. Ueda, H.
Hosono, H. Hiramatsu, M.Orita, M. Hirano and H. Kawazoe �gWide-gap p-type Cu(I)-containing layered oxychalcogenides�h Proc.10th Internatonal Ceramics Congress Part D |
| K. Ueda, K.
Takafuji, and H. Hosono �gPreparation and crystal structure analysis of CeCuOS�h J. Solid State Chem. 170 (2003) 182-187 |
| H. Hiramatsu, K. Ueda,
H. Ohta, M. Hirano, T. Kamiya, and H. Hosono �gWide gap p-type degenerate semiconductor: Mg-doped LaCuOSe�h Thin Solid Films 445 (2003) 304-308 |
| H. Hiramatsu, K. Ueda,
K. Takafuji, H. Ohta, M. Hirano, T. Kamiya, and H. Hosono �gIntrinsic excitonic photoluminescence and band-gap engineering of wide-gap p-type oxychalcogenide epitaxial films of LnCuOCh (Ln=La, Pr, and Nd; Ch=S or Se)semiconductor alloys�h J. Appl. Phys. 94 (2003) 5805-5808 |
| H. Hiramatsu, K. Ueda,
H. Ohta, M. Hirano, T. Kamiya and H. Hosono �gDegenerate p-type conductivity in wide-gap LaCuOS1-xSex (x=0-1) epitaxial films�h Appl. Phys. Lett. 82 (2003) 1048-1050 |
| H. Hiramatsu, K. Ueda,
H. Ohta, M. Hirano, and H. Hosono �gHeteroepitaxial growth of a wide gap p-type oxysulfide, LaCuOS�h Mat. Res. Soc. Symp. Proc. 747 (2003) V6.9.1-6 |
| K. Nomura, H. Ohta, K.
Ueda, T. Kamiya, M. Hirano, and H. Hosono �gElectron transport in InGaO3(ZnO)m (m=integer) studied using single-crystalline thin films and transparent MISFETs�h Thin Solid Films 445 (2003) 322-326 |
| K. Nomura, H. Ohta, K.
Ueda, T. Kamiya, M. Mirano, and H. Hosono �gFabrication of MISFET exhibiting normally-off characteristics using a single-crystalline InGaO3(ZnO)5 thin film�h Mat. Res. Soc. Symp. Proc. 747 (2003) V2.6.1-6 |
| K. Nomura, H. Ohta, K.
Ueda, T. Kamiya, M. Hirano and H. Hosono �gThin-film transistor fabricated in single-crystalline transparent oxide semiconductor�h Science 300 (2003) 1269-1272 |
| H. Ohta, K. Nomura, H.
Hiramatsu, K. Ueda, T. Kamiya, M. Hirano, and H.
Hosono �gFrontier of transparent oxide semiconductors�h Solid State Elec.47 (2003) 2261-2267 |
| S. Narushima, H.
Mizoguchi, K. Shimizu, K. Ueda, H. Ohta, M. Hirano, T.
Kamiya, and H. Hosono �gA p-type amorphous oxide semiconductor and room temperature fabrication of amorphous oxide p-n heterojunction diodes�h Adv. Mater. 15 (2003) 1409-1413 |
| H. Ohta, K. Nomura, H.
Hiramatsu, T. Suzuki, K. Ueda, M. Orita, M. Hirano,
Y. Ikuhara, and H. Hosono �gReactive solid-phase epitaxy�h Mat. Res. Soc. Symp. Proc. 747 (2003) V2.5.1-9 |
| H. Ohta, K. Nomura, M.
Orita, M. Hirano, K. Ueda, T. Suzuki, Y. Ikuhara,
and H. Hosono �gSingle-Crystalline Films of the Homologous Series InGaO3(ZnO)m Grown by Reactive Solid-Phase Epitaxy�h Adv. Func. Mater. 13 (2003) 139-144 |
| H. Ohta, M. Orita, H.
Hiramatsu, K. Nomura, M. Miyakawa, K. Ueda, M.
Hirano and H. Hosono �gFrontier of transparent conductive oxides�h Proc.10th Internatonal Ceramics Congress Part D 983-994 |
| S. Narushima, H.
Mizoguchi, H. Ohta, M. Hirano, M. Hirano, K. Shimizu, K.
Ueda, T. Kamiya, and H. Hosono �gX-ray amorphous p-type conductive oxide; ZnRh2O4�h Mat. Res. Soc. Symp. Proc. 747 (2003) V2.2.1-6 |
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