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Publications

K. Ueda, K. Takafuji, H. Hiramatsu, H. Ohta, T. Kamiya, M. Hirano, and H. Hosono
gElectrical and Optical Properties and Electronic Structures of LnCuOS (Ln=La~Nd)h
Chem. Mater. 15 (2003) 3692-3695
K. Ueda, S. Inoue, S. Hirose, H. Kawazoe, and H. Hosono
gWide-gap p-type conductive properties in layered oxychalcogenidesh
Mat. Res. Soc. Symp. Proc. 747 (2003) V2.1.1-11
K. Ueda, H. Hosono, H. Hiramatsu, M.Orita, M. Hirano and H. Kawazoe
gWide-gap p-type Cu(I)-containing layered oxychalcogenidesh
Proc.10th Internatonal Ceramics Congress Part D
K. Ueda, K. Takafuji, and H. Hosono
gPreparation and crystal structure analysis of CeCuOSh
J. Solid State Chem. 170 (2003) 182-187
H. Hiramatsu, K. Ueda, H. Ohta, M. Hirano, T. Kamiya, and H. Hosono
gWide gap p-type degenerate semiconductor: Mg-doped LaCuOSeh
Thin Solid Films 445 (2003) 304-308
H. Hiramatsu, K. Ueda, K. Takafuji, H. Ohta, M. Hirano, T. Kamiya, and H. Hosono
gIntrinsic excitonic photoluminescence and band-gap engineering of wide-gap p-type oxychalcogenide epitaxial films of LnCuOCh (Ln=La, Pr, and Nd; Ch=S or Se)semiconductor alloysh
J. Appl. Phys. 94 (2003) 5805-5808
H. Hiramatsu, K. Ueda, H. Ohta, M. Hirano, T. Kamiya and H. Hosono
gDegenerate p-type conductivity in wide-gap LaCuOS1-xSex (x=0-1) epitaxial filmsh
Appl. Phys. Lett. 82 (2003) 1048-1050
H. Hiramatsu, K. Ueda, H. Ohta, M. Hirano, and H. Hosono
gHeteroepitaxial growth of a wide gap p-type oxysulfide, LaCuOSh
Mat. Res. Soc. Symp. Proc. 747 (2003) V6.9.1-6
K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Hirano, and H. Hosono
gElectron transport in InGaO3(ZnO)m (m=integer) studied using single-crystalline thin films and transparent MISFETsh
Thin Solid Films 445 (2003) 322-326
K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Mirano, and H. Hosono
gFabrication of MISFET exhibiting normally-off characteristics using a single-crystalline InGaO3(ZnO)5 thin filmh
Mat. Res. Soc. Symp. Proc. 747 (2003) V2.6.1-6
K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Hirano and H. Hosono
gThin-film transistor fabricated in single-crystalline transparent oxide semiconductorh
Science 300 (2003) 1269-1272
H. Ohta, K. Nomura, H. Hiramatsu, K. Ueda, T. Kamiya, M. Hirano, and H. Hosono
gFrontier of transparent oxide semiconductorsh
Solid State Elec.47 (2003) 2261-2267
S. Narushima, H. Mizoguchi, K. Shimizu, K. Ueda, H. Ohta, M. Hirano, T. Kamiya, and H. Hosono
gA p-type amorphous oxide semiconductor and room temperature fabrication of amorphous oxide p-n heterojunction diodesh
Adv. Mater. 15 (2003) 1409-1413
H. Ohta, K. Nomura, H. Hiramatsu, T. Suzuki, K. Ueda, M. Orita, M. Hirano, Y. Ikuhara, and H. Hosono
gReactive solid-phase epitaxyh
Mat. Res. Soc. Symp. Proc. 747 (2003) V2.5.1-9
H. Ohta, K. Nomura, M. Orita, M. Hirano, K. Ueda, T. Suzuki, Y. Ikuhara, and H. Hosono
gSingle-Crystalline Films of the Homologous Series InGaO3(ZnO)m Grown by Reactive Solid-Phase Epitaxyh
Adv. Func. Mater. 13 (2003) 139-144
H. Ohta, M. Orita, H. Hiramatsu, K. Nomura, M. Miyakawa, K. Ueda, M. Hirano and H. Hosono
gFrontier of transparent conductive oxidesh
Proc.10th Internatonal Ceramics Congress Part D 983-994
S. Narushima, H. Mizoguchi, H. Ohta, M. Hirano, M. Hirano, K. Shimizu, K. Ueda, T. Kamiya, and H. Hosono
gX-ray amorphous p-type conductive oxide; ZnRh2O4h
Mat. Res. Soc. Symp. Proc. 747 (2003) V2.2.1-6

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